针对脉冲激光沉积(PLD)薄膜装置,建立了时间分辨等离子体发射光谱测量系统,在沉积类金刚石(DLC)薄膜时,通过对CII(426.7 nm)和CIII(229.7 nm)的发射谱测量发现,当脉冲激光轰击石墨靶材时,C发射谱强度均随时间变化,表现为由强变弱的时间变化过程,并且与靶材的表面状况有很强的相关性。实验过程中保持激光的脉冲频率和单脉冲能量不变,在石墨靶固定时,碳发射谱强度随时间呈快速下降趋势,当石墨靶旋转时,碳发射谱强度变化较为缓慢。实验发现,CIII 和CII的发射谱强度的比值随时间逐渐增大。

Time-resolved plasma emission spectrum measurement system is established for pulsed laser deposition (PLD) device. In diamond-like carbon film deposition,the intensity of CII(426.7 nm) and CIII(229.7 nm) emission is observed. The result is that the intensity decreases with deposition time,and depends strongly on target′s surface. Keeping pulse energy and frequency constant,when the target is held,the emission intensity decreases more quickly than that when the target is rotated. The ratio of CIII emission intensity to that of CII is found increasing with time.