利用电子束热蒸发技术在两种不同粗糙度的K9玻璃和一批单晶硅基底上沉积了单层二氧化钛(TiO2)薄膜,并对这些样片进行了氧离子后处理。采用泰勒-霍普森相关相干表面轮廓粗糙度仪(Talysurf CCI)分别对基底以及样片处理前后的表面粗糙度进行了研究,并用椭偏仪对离子处理前后的TiO2薄膜的折射率进行了测量。实验结果表明,TiO2薄膜对于基底具有一定的平滑作用;当基底粗糙度较大时,随着轰击离子能量的增加样片的表面粗糙度先减小后增加;当氧离子的轰击时间增加时,薄膜表面粗糙度会明显降低,随着轰击离子束流密度的增加,薄膜表面的粗糙度减小的幅度会增加。

Titanium dioxide (TiO2) thin films are deposited on two different roughness K9 glass and monocrystalline silicon substrates by electron beam evaporation technique and all samples are treated with oxygen ion beam. Surface roughness of substrates and all samples are measured using Talysurf CCI. The refractive index of TiO2 thin films is measured by an ellipsometer. The experimental results show that TiO2 thin films decrease the subatrate surface roughness,and ion beam post-treatment improves the surface roughness of TiO2 thin films. When the substrate roughness is larger,with the increase of ion energy,the surface roughness of TiO2 thin films decreases firstly,and then increases;with the increase of ion beam bombardment time,the surface roughness of TiO2 thin films decreases obviously. With the increase of ion beam density,the surface roughness of TiO2 thin films decreases. The surface roughness of all samples is also decreased with ion beam treatment.