光学技术, 2006, 32 (4): 0514, 网络出版: 2010-06-03
大口径光学平面的子孔径拼接检验研究
Study on the sub-aperture stitching interferometry for large plano-optics
摘要
研究了检测大口径光学平面的子孔径拼接法。通过采用最小二乘法对相邻两个子孔径重叠区域的数据进行分析,获得了子孔径之间的拼接参量,得到了被检验镜面的整体面形信息。编制了拼接检验的计算程序,并完成了原理性实验。采用一台口径为100mm的移相干涉仪检测了两个样品,给出了拼接检测与全口径检测的对比结果。样品的口径分别为100mm和91mm。对比检测结果表明,拼接检测与直接检测两种方法的RMS之差小于5nm。
Abstract
The principle of stitching interferometry for large plano-optics is analyzed. The wave-front data in the overlapping area are analyzed by using the algorithm of the least-square method. Stitching parameters between adjacent sub-aperture are calculated. Then the surface shape under testing is calculated. Furthermore,a practical program for stitching interferometry is compiled and related experiments are carried out. To examine the feasibility of stitching interferometry,a phase-shift interferometer of 100mm in capacity is utilized and the surface error of two samples are tested. One is 100mm in diameter and the other is 91mm in diameter. The results are measured in stitching interferometry and in direct measurement respectively. Maximum deviation in RMS between two methods is 5nm.
李新南, 张明意. 大口径光学平面的子孔径拼接检验研究[J]. 光学技术, 2006, 32(4): 0514. LI Xin-nan, ZHANG Ming-yi. Study on the sub-aperture stitching interferometry for large plano-optics[J]. Optical Technique, 2006, 32(4): 0514.