传统的抛光LBO晶体的方法是选用金刚石抛光粉在沥青抛光盘上抛光。沥青盘易于变形不容易修整，金刚石粉特别硬容易损伤抛光晶体表面。抛光过程中，抛光盘和抛光粉的选择是非常重要的，直接影响到抛光效率和最终的表面质量。新的抛光LBO晶体的方法，其抛光过程是一个化学机械过程，抛光盘、抛光粉和抛光材料相互作用。选用两种抛光盘(培纶和聚氨酯盘)，三种较软的抛光磨料(CeO₂，Al₂O₃和SiO₂胶体)，并在LBO晶体的(001)面进行抛光实验。用原子力显微镜测量和分析了表面粗糙度。结果表明，使用聚氨酯盘和SiO₂胶体能够获得无损伤超光滑的LBO晶体表面，其表面粗糙度的RMS为0．3nm。

In conventional polishing of LBO crystal,the polishing pad is pitch,the polishing abrasive is diamond. The polishing LBO crystal surface using the conventional polishing method is very difficult,and easily generates damages of LBO crystal surface. The selection of the polishing pad and abrasive is very important,which directly influences the surface finishing. A new technique is used to polish LBO crystal in order to obtain damage-free and super smooth surface. The polishing process is a chemical and mechanical process,which involves a simultaneous interaction among the polishing pad,the polishing abrasive and the material to be polished. In this study,two polishing pads (pellon and polyurethane),three soft polishing abrasives (colloidal SiO₂,Al₂O₃ and CeO₂) and LBO crystal (001) surface are involved. The surface roughness is measured by AFM. A damagefree and super smooth surface of LBO crystal with 0.3 nm RMS roughness is obtained by adopting the polyurethane pad and colloidal SiO₂ in the experiments.