应用光学, 2008, 29 (4): 0557, 网络出版: 2010-06-03  

透射式碲铯(Cs2Te)光阴极厚度不均匀现象消除方法的研究

Method for eliminating thickness non-uniformity of transmission Cs2Te photocathode
程宏昌 1,2,*石峰 1,2冯刘 1,2刘晖 1,2史鹏飞 1,2
作者单位
1 微光夜视技术国防科技重点实验室,陕西 西安 710065
2 西安应用光学研究所 陕西 西安 710065
摘要
为解决透射式Cs2Te光阴极厚度不均匀问题,通过理论和实验研究,分析了产生此问题的机理及其影响因素。这些因素包括:蒸发源发生器形状及其与阴极基底之间的相对位置;Cs/Te原子在阴极基底表面上完成化学反应所需的结合能以及制作阴极前基底表面所能达到的温度均匀性水平等。实验证明,上述最后一个因素是影响Cs2Te光阴极厚度不均匀的主要原因。通过改变加温程序,优化保温时间,均衡阴极基底与阴极托盘温度梯度等途径,使得制作的透射式Cs2Te光阴极厚度不均匀性由原来的76.4%,改善为<10%。
Abstract
To solve the problem of thickness non-uniformity of the transmission mode Cs2Te photocathode,the mechanism producing the problem and the influencing factors were analyzed on the basis of theoretical and experimental research. The factors that influence the thickness non-uniformity include the shape of the evaporator,the relative position of the evaporator with the photocathode substrate,the binding energy needed by the Cs/Te atom to complete the mechanical reaction on the photocathode substrate and the temperature uniformity level of the substrate surface before the fabrication of the photocathode. The experiment proves that the last factor has the most important effect on the thickness non-uniformity of the transmission mode Cs2Te photocathode. By changing the heating program,optimizing the warm preservation time and balancing the temperature gradient of the photocathode substrate and pallet,the thickness non-uniformity of the transmission Cs2Te photocathode was improved from 76.4% to less than 10%.

程宏昌, 石峰, 冯刘, 刘晖, 史鹏飞. 透射式碲铯(Cs2Te)光阴极厚度不均匀现象消除方法的研究[J]. 应用光学, 2008, 29(4): 0557. CHENG Hong-chang, SHI Feng, FENG Liu, LIU Hui, SHI Peng-fei. Method for eliminating thickness non-uniformity of transmission Cs2Te photocathode[J]. Journal of Applied Optics, 2008, 29(4): 0557.

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