制备了多种不同PMPS/BzMA质量比合成的PMPS-PBzMA共聚物,研究了旋涂成膜的膜厚控制方法和最佳热处理温度。近红外谱证实该材料在1310 nm和1550 nm两个窗口吸收小。实验表明,PMPS-PBzMA的光漂白效应主要来自于Si-Si的光氧化并伴有轻微的折射率各向异性,饱和过程则来自于Si-苯基的光分解且有助于缓解各向异性。归纳了初始折射率和饱和折射率与PMPS/BzMA质量比的关系,发现PMPS/BzMA质量比W(PMPS):W(BzMA)=10%制成材料的初始折射率与质量比W(PMPS):W(BzMA)=100%材料饱和折射率十分接近。据这些特性,利用质量比W(PMPS):W(BzMA)=10%材料的初始折射率和质量比W(PMPS):W(BzMA)=100%材料的饱和折射率,结合光漂白技术,成功试制了折射率对称分布的掩埋型多模PMPS-PBzMA条形波导,1310 nm的传输损耗达到了0.91 dB/cm。

PMPS-PBzMA copolymer is prepared using PMPS/BzMA with different mass ratios,the methods of controlling film thickness by spin-coating and the best heat treatment temperature are studied. Near-infrared spectroscopy confirm that the material′s absorption is low in the 1310 nm and 1550 nm communications windows. Experiments show that the photobleaching effect of PMPS-PBzMA is mainly due to the Si-Si photo-oxidation,and accompanies by a slight refractive index anisotropy. Reduction of refractive index in saturation process is due to the Si-phenyl-light decomposition,and this process will alleviate the anisotropy. Experiments summarize in the relationship among the initial refractive index,the saturation refractive index and the PMPS/BzMA mass ratio,and find out that the initial refractive index of material prepared using W(PMPS):W(BzMA)=10% and the saturation refractive index of material prepared using W(PMPS):W(BzMA)=100% are approximate. According to these features,using initial refractive index of W(PMPS):W(BzMA)=10% material and saturation refractive index of W(PMPS):W(BzMA)=100% material and photobleaching techniques,multi-mode embedded waveguides are successfully fabricated,the propagation loss in a channel waveguide is 0.91 dB/cm at a wavelength of 1310 nm.