光学学报, 2010, 30 (8): 2284, 网络出版: 2010-08-13
激光预处理ZrO2-SiO2 1064 nm高反射膜的机理
Mechanism of Laser-Conditioning ZrO2-SiO2 High Reflective Thin Film at 1064 nm
激光技术 激光预处理 缺陷阈值 缺陷密度 预处理效果 laser technique laser-conditioning defects threshold defects density ZrO2-SiO2 ZrO2-SiO2 laser-conditioning effects
摘要
分析了激光预处理对ZrO2-SiO2 1064 nm 高反射膜激光损伤阈值以及引起损伤缺陷的影响。在以缺陷损伤阈值和缺陷密度表征缺陷的基础上,研究了预处理前后薄膜中引起损伤缺陷的变化情况。研究了激光预处理能量和预处理效果的关系。结果表明,激光预处理可以清除ZrO2-SiO2 1064 nm 高反射膜中低阈值的缺陷,但预处理能量密度较高时,可以使薄膜中高阈值缺陷转化成低阈值缺陷。因此扫描预处理应采用相对较低的能量密度。
Abstract
The influence of laser-conditioning scanning process on the damage threshold and the initiating defects of ZrO2-SiO2 1064 nm high reflective (HR) coatings is analyzed.The changes of initiating defects in films are investigated before and after laser-conditioning scanning process based on that defects damage and density are used to characterize the initiating defects.The relation between the laser-conditioning energy density and the laser-conditioning effect is also investigated.It is found that the defects with lower threshold can be removed by laser-conditioning process.However,the defects with higher threshold can be transformed to defects with lower threshold when the scanning energy density is higher.So the laser energy density used in the laser-conditioning scanning process should be relatively lower.
李笑, 刘晓凤, 单永光, 赵元安, 邵建达, 范正修. 激光预处理ZrO2-SiO2 1064 nm高反射膜的机理[J]. 光学学报, 2010, 30(8): 2284. Li Xiao, Liu Xiaofeng, Shan Yongguang, Zhao Yuanan, Shao Jianda, Fan Zhengxiu. Mechanism of Laser-Conditioning ZrO2-SiO2 High Reflective Thin Film at 1064 nm[J]. Acta Optica Sinica, 2010, 30(8): 2284.