为了研制低损耗、高性能的193 nm氟化物高反膜,对193 nm氟化物高反膜的设计、制备与性能分析进行了深入探讨。用挡板法和预镀层技术相结合,实现了在现有镀膜机上对193 nm薄膜的膜厚控制。在熔石英基底(JGS1)上,用热舟蒸发制备了不同氟化物材料组合高反膜,对不同氟化物材料组合高反膜的反射率、透射率和光学损耗等光学特性,横截面形貌和表面粗糙度等微结构以及应力等特性进行了讨论和比较。在对不同材料组合高反膜性能分析比较的基础上,对应用于高反膜膜材料组合进行了优化选择,以NdF3/AlF3为材料对,设计制备了193 nm高反膜。193 nm氟化物高反膜的反射率达到96%。

In order to develop low loss,high-performance 193 nm fluoride high reflection (HR) mirrors,the properties of 193 nm HR mirrors are researched in depth in this paper. The thickness of 193 nm reflective film is controlled by a 1/3 baffle with pre-coating technology. Different fluoride HR mirrors are deposited by a molybdenum boat evaporation process on fused silica substrates. Their optical properties (including reflectance,transmittance,and optical loss),microstructures (including cross section morphology and surface roughness) and mechanical properties (stress) are investigated and compared. Based on these studies,the NdF3/AlF3 193 nm HR mirror is designed and made. Under the present experimental conditions,its reflectance is up to 96%.