为了实现光学非球面元件的高精度加工，对先进的离子束加工系统进行了研究。通过对离子束加工系统的分析，给出了加工非球面光学元件的离子源子系统运动模型公式，并将求解驻留时间的反卷积过程转化为求解线性矩阵方程过程以便优化求解。分析了加工过程中出现的离子源定位误差，指出其对最终面形精度的影响可归结为一个系数因子的控制上，并提出了综合考虑离子束材料去除函数和定位误差的方法来控制系数因子以降低对定位系统精度的苛刻要求。仿真验证表明，该模型计算出的驻留时间函数可以有效地保证光学元件的面形精度达0.0381λ；离子束定位误差引起的面形精度的变化量满足最大变化量公式的限制。该模型可用于各种非球面光学元件离子束加工过程驻留时间的求解和设备的定位误差设计，在保证过程稳定的同时降低了设备成本。

Ion Beam Figuring (IBF) technology was investigated for application to a high-precision optical aspheric. With the analysis of the IBF system, the motion model formulas of an ion source subsystem were presented for figuring aspheric optics and other optics by the IBF facility. The de-convolved process of the dwell time function was transferred to a linear matrix equation, which could be easily optimized to get the optimized dwell time solution. Using an analysis of the location errors, this paper proposes that the final figure errors caused by the location errors of the ion source five-axis motion subsystem could be attributed to a coefficient factor. The best way to avoid the location precision requirements is to take both the ion beam material removal function and the location errors into account in designing the five-axis system accurately. The simulation example proves that the dwell time function obtained from this model is effective in assuring the final optical element figure precision(0.038 1λ).The final optical element figure errors from the location errors of the ion source five-axis motion subsystem are bound by the range of maximum difference. So this model can be used for all kind of optics to determine the dwell time function and to design the location subsystem error precision, and also to assure that the IBF process is stable and feasible at the minimal cost.