强激光与粒子束, 2010, 22 (7): 1535, 网络出版: 2010-09-15
磁控溅射方法制备直径120 mm高均匀性Mo/Si多层膜
Fabrication of a high uniformity Mo/Si multilayer with a diameter of 120 mm using magnetron sputtering technology
Mo/Si多层膜 磁控溅射 均匀性 反射率 同步辐射 Mo/Si multilayer magnetron sputtering uniformity reflectivity synchrotron radiation
摘要
为满足极紫外、软X射线和X射线大口径多层膜反射镜的需求, 采用基板扫掠过矩形靶材表面的镀膜方法, 在直径120 mm的平面基板上镀制了Mo/Si周期多层膜。通过调整基板扫掠过矩形靶材表面的速率修正了薄膜的沉积速率, 极大地提高了薄膜厚度的均匀性。采用X射线衍射仪对反射镜不同位置多层膜周期厚度进行了测量, 结果表明, 在直径120 mm范围内, Mo/Si多层膜周期厚度的均匀性达到了0.26%。同步辐射测量多层膜样品不同位置处的反射率, 结果表明, 在直径120 mm范围内, 多层膜的膜层厚度均匀, 在入射角10°时13.75 nm波长处平均反射率为 66.82%。
Abstract
In order to prepare the larger size of multilayer mirror for Extreme ultraviolet (EUV), soft X-ray and X-ray application, Mo/Si multilayer was deposited on flat substrate in diameter of 120 mm by using substrate scanning over rectangle targets coating method. By adjusting the moving velocity of substrate scanning over the sputtering targets, the depositing rate can be controlled, and the uniformity of layer thickness distribution is improved significantly. After deposition, the period thicknesses of multilayer on different positions of the mirror were measured by an X-ray diffractometer (XRD). The measured results show that, along the diameter of 120 mm, the uniformity of period thickness is within 0.26%. The reflectivities on different positions of the multilayer mirror were measured at synchrotron radiation laboratory. The results indicate that the thickness distribution is uniform and the multilayer quality is good. The mean reflectivity is 66.82% at wavelength of 13.75 nm and incident angle of 10 degree.
潘磊, 王晓强, 张众, 朱京涛, 王占山, 李乙洲, 李宏杰, 王道荣, 赵巨岩, 陆伟. 磁控溅射方法制备直径120 mm高均匀性Mo/Si多层膜[J]. 强激光与粒子束, 2010, 22(7): 1535. Pan Lei, Wang Xiaoqiang, Zhang Zhong, Zhu Jingtao, Wang Zhangshan, Li Yizhou, Li Hongjie, Wang Daorong, Zhao Juyan, Lu Wei. Fabrication of a high uniformity Mo/Si multilayer with a diameter of 120 mm using magnetron sputtering technology[J]. High Power Laser and Particle Beams, 2010, 22(7): 1535.