在达到1 nm量级的光学元件表面面形干涉检验时，被检元件由温度变化引起的面形偏差是不能忽略的。分析了干涉检验时存在的各种环境温度情况，对不同情况下被检元件内外温度分布进行了仿真，并将温度场作为静力学分析的载荷条件，进行了镜面温度变形分析。计算出了带支撑的直径为300 mm凸球面透镜在不同温度分布下的镜面变形量，并通过球面拟合计算出面形的峰谷(PV)值和均方根(RMS)值，得出要保证1 nm精度的面形测量就需要保证环境温度水平漂移不超过±0.1 ℃，镜子轴向温度差不超过±0.05 ℃，直径方向温度差不超过±0.1 ℃的结论，为高精度面形检测的实施提供了参考。

For interferometric testing of optics with surface qualities of approximately 1 nm, thermally caused deformation of mirror surface cannot be ignored. The various temperature conditions of interferometer environment are analyzed and temperature distribution of the mirror under test is simulated using I-Deas software. The temperature distribution was then used as thermal load of linear static analysis to perform mirror thermal deformation analysis. The peak-valley value and root-mean-square value surface figure error of a 300 mm convex lens caused by ambient temperature fluctuation is achieved. The environmental temperature fluctuation should be less than ±0.1 ℃, temperature difference be less than ±0.05 ℃ in mirror axis direction and ±0.1 ℃ in mirror diameter direction to perform optical test of 1 nm surface figure error, which is instructive to high quality optical testing.