采用离子源辅助电子束蒸发的方法，制备了以Si为基底，以TiO2为缓冲层的ZnO薄膜。通过进一步保温处理，在不同温度条件下进行退火处理得到了不同的样品薄膜，用于表面形貌分析和光散射特性实验研究。结果表明，退火温度对样品表面粗糙度、晶粒大小、分形维数等参数具有显著的影响，通过表面形貌分析有助于更好地理解薄膜晶粒生长机制和改进薄膜制备工艺；不同薄膜样品的反射光强度和偏振度对不同偏振光具有不同的角度响应特征，且与薄膜表面统计特性具有一定的关联性，薄膜的光散射特性研究对研究弱散射随机粗糙表面的退偏作用具有一定的参考价值。

The ion source electron beam evaporation method was used to fabricate ZnO films with Si as the base and TiO2 as the buffer layer. By further thermal insulation, and annealing treatment at different temperature conditions, different film samples were prepared for the surface morphology analysis and light scattering properties study. The experimental results show that annealing temperature has significant influence on the sample surface roughness, grain size, fractal dimension and other parameters, and the surface morphology analysis is helpful to understand the grain growth mechanisms of film and improve the film preparation process. The intensity and polarization degree of reflected light for different film samples have different response to different polarized lights, which has some relevance to the surface statistical properties of film samples. The light scattering properties study of thin films has some reference value for the study of depolarization effect for weak scattering random rough surface.