Chinese Optics Letters, 2011, 9 (2): 023102, Published Online: Mar. 3, 2011
Mo/Si aperiodic multilayer broadband reflective mirror for 12.5–28.5-nm wavelength range 
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多层膜 宽带 极紫外 磁控溅射 同步辐射 310.1860 Deposition and fabrication 230.4170 Multilayers 340.7480 X-rays, soft x-rays, extreme ultraviolet (EUV) 340.6720 Synchrotron radiation
Abstract
Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5–28.5 nm at incidence angle of 5? is developed using a numerical optimized method. The multilayer is prepared using direct current magnetron sputtering technology. The reflectivity is measured using synchrotron radiation. The measured mean reflectivity is 7.0% in the design wavelength range of 12.5–28.5 nm. This multilayer broadband reflective mirror can be used in extreme ultraviolet measurements and will greatly simplify the experimental arrangements.
Moyan Tan, Haochuan Li, Qiushi Huang, Hongjun Zhou, Tonglin Huo, Xiaoqiang Wang, Jingtao Zhu. Mo/Si aperiodic multilayer broadband reflective mirror for 12.5–28.5-nm wavelength range[J]. Chinese Optics Letters, 2011, 9(2): 023102.
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