Chinese Optics Letters, 2011, 9 (2): 023103, Published Online: Mar. 3, 2011
Single- and multi-shot laser-induced damages of Ta2O5/SiO2 dielectric mirrors at 1064 nm 
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Ta2O5/SiO2高反膜 激光损伤阈值 多脉冲损伤 累积效应 310.6870 Thin films, other properties 140.3330 Laser damage 230.4040 Mirrors 230.4170 Multilayers
Abstract
Ta2O5/SiO2 dielectric mirrors deposited by ion beam sputtering (IBS) are studied. The multi-shot laser-induced damage threshold (LIDT) and its dependence on the number of shots are investigated, after which we find that the multi-shot LIDT is lower than that of single-shot. The accumulation effects of defects play an important role in the multi-shot laser damage. A simple model, which includes the conduction band electron production vsa multiphoton and impact ionizations, is presented to explain the experimental phenomena.
Ying Wang, Hongbo He, Yuan'an Zhao, Yongguang Shan, Dawei Li, Chaoyang Wei. Single- and multi-shot laser-induced damages of Ta2O5/SiO2 dielectric mirrors at 1064 nm[J]. Chinese Optics Letters, 2011, 9(2): 023103.
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