光子学报, 2011, 40 (1): 1, 网络出版: 2011-03-08
自支撑Zr膜制备及软X射线透过性能研究
Preparation and Research on Self-supported Zr Filter for Soft-X-ray
自支撑薄膜 软X射线 脱模剂 磁控溅射 同步辐射 Self-supported thin film Extreme Ultra Violet(EUV) Release agent Magnetron sputtering Synchrotron radiation
摘要
软X射线波段滤光膜材料大都为自支撑金属薄膜,实验室环境下自支撑薄膜长期与空气接触表面易氧化,空气中的杂质原子进入自支撑薄膜内部,致使自支撑膜光学性能大幅下降.5 nm至20 nm软X射线波段Zr具有较低的质量吸收系数和较小的密度,在该波段Zr滤光膜透过率较高.采用脱模剂法制备自支撑Zr膜,在洁净的浮法玻璃上蒸镀一层NaCl做为脱膜剂,直流磁控溅射沉积Zr膜,脱膜后的到自支撑Zr膜.为防止薄膜表面氧化及空气中杂质原子进入薄膜内部,在Zr膜两面各直流磁控溅射沉积一层10 nm厚的C或Si膜作为保护膜,得到C/Zr/C、Si/Zr/Si复合膜,测试结果显示C或Si膜的引入对于自支撑Zr膜光学性能基本无影响.
Abstract
Filters for soft-x-ray are mostly self-supported metal thin films. Under experimental circumstance, while long exposure to the air of the self-supported metal thin film, impurity atoms will enter into self-supported thin film, which will result in decline of self-supported thin film′s optics performance. Zr filters have high transmittance at band from 5 nm to 20 nm because of its low mass absorption coefficient and density. After vapor depositing NaCl film on cleaned float glass as a release agent, Zr film was sputtered on NaCl film. Self-supported Zr film wass prepared after NaCl film being dissolved in deionized water. To prevent surface oxidizing and impurity atoms from the air entering Zr film in experimental environment, C or Si film with 10 nanometer thickness was sputtered on both Zr film sides for separating Zr from the air. Measurement result of C/Zr/C and Si/Zr/Si film shows that C or Si film has little influence on self-supported Zr film performance.
伍和云, 吴永刚, 王振华, 吕刚, 凌磊婕, 夏子奂, 陈乃波. 自支撑Zr膜制备及软X射线透过性能研究[J]. 光子学报, 2011, 40(1): 1. WU He-yun, WU Yong-gang, WANG Zhen-hua, LU Gang, LING Lei-jie, XIA Zi-huan, CHEN Nai-bo. Preparation and Research on Self-supported Zr Filter for Soft-X-ray[J]. ACTA PHOTONICA SINICA, 2011, 40(1): 1.