概述了193nm薄膜激光诱导损伤的研究进展。通过对紫外到深紫外波段几种典型薄膜损伤形貌的介绍，对比分析了193nm薄膜激光诱导损伤的可能原因。指出在该波段的氧化物薄膜损伤中，吸收是导致薄膜大块损伤的重要因素，而氟化物的薄膜损伤则是由沉积过程的膜层局部缺陷造成。根据薄膜样品的损伤分析表明，薄膜的某些制备参量与激光损伤阈值相关联。为提高薄膜元件的抗激光损伤能力，分别从薄膜材料的选择、膜系设计的完善以及沉积工艺的优化等3个方面出发，总结出改善薄膜激光损伤阈值的方法。

Research progress of laser induced damage of coating at 193nm was reviewed. After some typical damage morphologies from UV to DUV were compared, the possible reasons for the laser damage of the coating were put forward. The absorption of oxide coating at 193nm was responsible for the massive damage, while the damage of fluoride coating at 193nm was induced by local deposit defects. The dependence of the laser induced damage threshold on the thin film preparation parameters was known according to the damage analysis of the specimen. The methods to enhance the laser induced damage threshold were summarized by material chose, coating design and deposition process.