为了获得高质量光学表面的碳化硅反射镜, 利用射频磁控溅射方法, 在直径70 mm的RB-SiC基片上沉积了厚约100 μm的Si改性涂层, 对改性层进行超光滑加工, 并对改性层的表面形貌及性能进行了测试。ZYGO表面粗糙度仪测试结果表明, 抛光后Si改性涂层表面粗糙度均方根值达到了0.496 nm；X射线衍射仪测试显示, 制备Si改性涂层为多晶结构；使用拉力机做附着力测试, 结果表明膜基附着力大于10.7 MＰa。证明采用磁控溅射技术制备的Si改性涂层均匀、致密、附着力好, 能够满足RB-SiC材料表面改性要求。

In order to manufacture fine optical surface of RB-SiC mirror, Si surface-modified coatings with 100 μm thick were prepared by RF magnetron sputtering on the RB-SiC substrate of 70 mm diameter, then a series of polishing experiments on Si coatings were accomplished, finally, correlated performance of the Si coatings were tested and analyzed. Results show that: surface roughness of the surface-modified RB-SiC achieves 0.496 nm(RMS) by ZYGO surface profilometer, the Si coating is polycrystal by XRD, and the adhesion measuring by direct pull-off method is more than 10.7 MPa. It demonstrates that PVD Si coating can satisfy the RB-SiC material surface modification request.