在狭缝微等离子体中, 研究了Ar Ⅰ(2P2→1S5)光谱线的展宽和频移随放电参数的变化。 为了测量谱线频移, 采用低气压(10 Pa左右)氩气放电发射的Ar Ⅰ光谱线作为参考线。 实验在氩气含量为99.92%的氩气/空气放电中, 测量了气压从1×104 Pa增大到6×104 Pa时Ar Ⅰ谱线的频移和展宽。 结果表明随着气压的升高, Ar Ⅰ谱线的展宽和频移均线性增大, 说明电子密度随着气压的升高而增大。 实验还研究了放电气隙间距为100及300 μm时, Ar Ⅰ发射谱线的频移及展宽的变化, 结果发现随着放电气隙间距的增加, 谱线的频移及展宽均增加, 表明电子密度随着放电气隙间距的增大而升高。

The variations of width and shift of Ar Ⅰ(2P2→1S5) spectral line with discharge parameters were studied in a slot microplasma. In order to measure the wavelength shift, the Ar Ⅰ(2P2→1S5) spectral line emitted from argon discharge at pressure of 10 Pa was used as a reference line. With the gas pressure increasing in the range of 1×104～6×104 Pa, the width and shift of Ar Ⅰ(2P2→1S5) spectral line were measured in argon (99.92%)/air discharge. It was found that both the width and the shift of Ar Ⅰ(2P2→1S5) spectral line increase linearly with the increase in gas pressure, indicating that the electron density increases with the increase in gas pressure. In addition, the width and the shift of Ar Ⅰ(2P2→1S5) spectral line at gas gap width of 100 and 300 μm were measured for comparison. It was found that both increase with the increase in gas gap width, which indicates that the electron density in the slot microplasma increases with the increase in gas gap width.