结合本实验室及国内外同行的工作进展，概括性地介绍了光学薄膜中节瘤缺陷的生长特性、结构特征和损伤特性，以及激光预处理和破坏修复技术的研究进展。节瘤种子的尺寸、形状和表面特性决定了节瘤缺陷的尺寸、边界结构的连续性和表面形貌特征。节瘤种子的来源主要有基底加工和清洗过程的残留物，镀膜过程中真空室的污染和蒸发材料的喷溅，并给出了相应的抑制方法。节瘤的电场增强效应是导致节瘤缺陷易损伤的另一个重要原因。节瘤缺陷的激光预处理和破坏坑的修复技术可以提高光学薄膜的抗激光损伤能力。

Based on our achievements and that of peers of home and abroad, several aspects of nodular defect are summarized and reviewed. The size, shape and surface properties of nodule seed determinate the size, boundaries continuity and topography of nodule. The seed sources are mainly the residue during the processing and cleaning of substrate, contamination from the coating chamber and particulate from the evaporation source material. The corresponding methods to eliminate the seed source are given. The electronic field enhancement is another main reason for the damage susceptibility of nodule. Laser conditioning and mitigation method can improve the capacity of laser damage resistance.