为了减小常规多层膜的带宽，提高其光谱分辨率，对采用低原子序数材料组成的适用于极紫外和软X射线波段的多层膜进行了研究。首先，在14 nm波长处选取3种低原子序数材料对Si/B4C，Si/C和Si/SiC组成多层膜，用随机搜索的方法优化设计了这3种多层膜以及在此波段常用的Mo/Si多层膜。然后，用直流磁控溅射的方法制备Si/B4C,Si/C,Si/SiC和Mo/Si多层膜,并用X射线衍射仪测量拟合多层膜的周期厚度。最后，用同步辐射测试多层膜的反射率。同步辐射测试结果显示，Mo/Si多层膜的带宽最大，为0.57 nm；Si/SiC多层膜的带宽最小，为0.18 nm，结果与理论基本一致。实验结果表明，低原子序数材料多层膜的带宽要比常规Mo/Si多层膜窄，使用低原子序数材料组成多层膜可以提高多层膜的光谱分辨率。

In order to decrease the bandwidth of the normal multilayers and improve the spectral resolution, several kinds of multilayers composed of low-Z materials were investigated in extreme ultraviolet and soft X-ray regions. Firstly, three kinds of multilayers of low-Z materials, Si/B4C,Si/C and Si/SiC multilayers were chosen at the wavelength of 14 nm and these multilayers and a normal Mo/Si multilayer were designed by using a random search method. Then all these multilayers were fabricated with a DC magnetron sputtering system and the thicknesses were measured by an X-ray diffractometer. Finally, the reflectivities of multilayers were measured by the synchrotron radiation. The synchrotron radiation tests show that the largest bandwidth of these multilayers is from the Mo/Si multilayer in 0.57 nm, and the smallest one is from Si/SiC multilayer in 0.18 nm.The results correspond with the design and demonstrate that the bandwidths of multilayers of low-Z materials are narrower than that of the normal Mo/Si multilayer and the multilayers of low-Z materials can achieve a higher spectral resolution.