Chinese Optics Letters, 2011, 9 (10): 103103, Published Online: Aug. 24, 2011
Accumulation effect of SiO2 protective layer on multi-shot laser-induced damage in high-reflectivity HfO2/SiO2 coatings Download: 692次
Abstract
The accumulation effects in high-reflectivity (HR) HfO2/SiO2 coatings under laser irradiation are investigated. The HR HfO2/SiO2 coatings are prepared by electron beam evaporation at 1 064 nm. The laser-induced damage threshold (LIDT) are measured at 1 064 nm and at a pulse duration of 12 ns, in 1-on-1 and S-on-1 modes. Multi-shot LIDT is lower than single-shot LIDT. The laser-induced and native defects play an important role in the multi-shot mode. A correlative theory model based on critical conduction band electron density is constructed to elucidate the experimental phenomena.
Ying Wang, Hongbo He, Yuan'an Zhao, Yongguang Shan, Chaoyang Wei. Accumulation effect of SiO2 protective layer on multi-shot laser-induced damage in high-reflectivity HfO2/SiO2 coatings[J]. Chinese Optics Letters, 2011, 9(10): 103103.