A p-type AlAs(70.2 nm)/16.5 period [GaAs(3 nm)/AlAs(0.7 nm)] semiconductor/superlatice distributed Bragg reflector (DBR) has been grown on n+- GaAs ( 100 ) substrate by V80H molecular beam epitaxy system. Experimental reflection spectrum shows that its central wavelength is 820 nm, with the peak reflectivity for 10 -pair DBR of as high as 96 %, and the reflection bandwidth of as wide as 90 nm. We formed a 20×20μm2square mesa to measure the series resistance using wet chemical etching. From the measurement result, the series resistance of about 50Ωis obtained at a moderate doping (3×1018cm-3). Finally, the dependence of the resistance of the DBR on the temperature is analyzed. From the experimental result, it is found that the mechanism of the low series resistance of this kind of DBR may increase the tunneling current in the semiconductor/superlattice mirror structure, which will result in a decrease in series resistance.