半导体光子学与技术, 2004, 10 (4): 248, 网络出版: 2011-08-15
Optical Properties of Silicon-doped InGaN and GaN Layers
Optical Properties of Silicon-doped InGaN and GaN Layers
摘要
Abstract
The optical properties of Silicon-doped InGaN and GaN grown on sapphire by MOCVD have been investigated by photoluminescence (PL) method. At room temperature, the band-gap peak of InGaN is 437.0 nm and its full width of half-maximum (FWHM) is about 14.3 nm. The band-gap peak and FWHM for GaN are 364.4 nm and 9.5 nm, respectively. By changing the temperature from 20 K to 293 K, it is found that the PL intensity of samples decreases but the FWHM broadens with the increasing of the temperature. GaN sample shows red-shift, InGaN sample shows red-blue-red-shift. The temperature dependence of peak energy shift is studied and explained.
KANG Ling, LIU Bao-lin, CAI Jia-fa. Optical Properties of Silicon-doped InGaN and GaN Layers[J]. 半导体光子学与技术, 2004, 10(4): 248. KANG Ling, LIU Bao-lin, CAI Jia-fa. Optical Properties of Silicon-doped InGaN and GaN Layers[J]. Semiconductor Photonics and Technology, 2004, 10(4): 248.