微纳光学结构制备技术一直是微纳光子学器件发展的技术瓶颈。针对微纳光学结构制备技术向小尺寸、高精度和广泛应用发展的趋势，报道了基于电子束、X射线和接近式光学的混合光刻制作微纳金属光学结构技术。针对微纳光子学器件复杂图形开发了微光刻数据处理体系，基于矢量扫描电子束光刻设备在自支撑薄膜上进行1×高分辨率图形形成，利用X射线光刻进行高高宽比微纳图形复制，再利用低成本接近式光学光刻技术进行金属加强筋制作。还报道了自支撑X射线金光栅衍射效率和抗振测试结果。

Fabrication of micro- and nano-optical structures has been the technical bottlenecks in the development of micro- and nano-photonic devices. In order to meet the small size, high precision and wide applications requirements raised by micro- and nano-optical structure fabrication technologies, we report the electron beam/X-ray/optical mixed lithography technology for the fabrication of micro- and nano-optical structures. Home-made microlithography data processing technology is developed for the generation of complex patterns of micro- and nano-optical photonic devices, 1× high-resolution patterning of the membrane-type masks is carried out by a vector-scanned electron beam lithography tool, high-aspect-ratio micro- and nano-optical patterns are replicated by X-ray lithography, and accurate overlay between X-ray lithography and low-cost optical proximity lithography is carried out for the generation of metal ribs. The results of diffraction efficiency test and seismic experiment for free-standing X-ray gold gratings are also reported.