光学学报, 2011, 31 (10): 1005008, 网络出版: 2011-09-16
角分辨光电子能谱光束线1200 line/mm光栅研制
Fabrication of 1200 line/mm Laminar Grating for ARPES
衍射光栅 全息光刻 离子束刻蚀 角分辨光电子能谱 diffraction grating holographic lithography ion-beam etching angle-resolved photoemission spectroscopy
摘要
国家同步辐射实验室新建了覆盖5~40 eV的低能区高分辨率角分辨光电子能谱光束线。其球面光栅单色仪包含了三块光栅,即300,600和1200 line/mm球面层式(Laminar)光栅。采用全息离子束刻蚀工艺,在硅光栅基片上成功地刻蚀出1200 line/mm、占空比0.35、槽深35 nm、有效刻划面积大于120 mm×20 mm的Laminar光栅。在角分辨光电子能谱光束线完成调试的同时,进行了初步的光谱标定及性能测试。波长的刻度和光谱测试直接采用波荡器辐射作为光源,用已知气体的吸收峰做标准来进行标定。测量结果表明:1200 line/mm光栅测量Ar的吸收谱,在29.2 eV附近可得到2.6 meV的能量分辨,分辨本领约为11000,满足了光束线设计要求。
Abstract
A high resolution vacuum ultraviolet (VUV) beamline covering 5~40 eV photon energy range for study of angle-resolved photoemission spectroscopy (ARPES) is constructed newly at the National Synchrotron Radiation Laboratory (NSRL). There are three pieces of gratings, with groove densities of 300, 600 and 1200 line/mm respectively in the spherical grating monochromator (SGM). The laminar grating with groove density of 1200 line/mm, duty cycle of 0.35, groove depth of 35 nm, and active area larger than 120 mm×20 mm is fabricated using holographic-ion beam etching on silicon substrate. The spectral calibration and performance test are performed during the ARPES beamline early adjustment and test. The undulator radiation is used directly as light source for the wavelength calibration and spectroscopic test, and absorption peaks of known gas as a standard for calibration. The results show that the energy resolution can reach 2.6 meV around 29.2 eV in absorption spectrum of Ar using 1200 line/mm grating and slit opening of 30 μm, namely energy resolving power of 11000, which meets the demand of design specifications.
徐向东, 刘正坤, 邱克强, 刘颖, 洪义麟, 付绍军. 角分辨光电子能谱光束线1200 line/mm光栅研制[J]. 光学学报, 2011, 31(10): 1005008. Xu Xiangdong, Liu Zhengkun, Qiu Keqiang, Liu Ying, Hong Yilin, Fu Shaojun. Fabrication of 1200 line/mm Laminar Grating for ARPES[J]. Acta Optica Sinica, 2011, 31(10): 1005008.