强激光与粒子束, 2011, 23 (9): 2386, 网络出版: 2011-10-27   

溅射功率对Mo薄膜微结构和性能的影响

Effects of sputtering power on structure and property of Mo films deposited by DC magnetron sputtering
作者单位
1 西华师范大学 物理与电子信息学院, 四川 南充 637002
2 中国工程物理研究院 激光聚变研究中心 等离子体物理重点实验室, 四川 绵阳 621900
摘要
实验采用直流磁控溅射沉积技术在不同溅射功率下制备Mo膜,研究了不同溅射功率下Mo膜的沉积速率、表面形貌及晶型结构,并对其晶粒尺寸和应力进行了研究。利用原子力显微镜观察样品的表面形貌发现随着溅射功率的增加,薄膜表面粗糙度逐渐增大。X射线衍射分析表明薄膜呈立方多晶结构,晶粒尺寸为14.1~17.9 nm;应力先随溅射功率的增大而增大,在40 W时达到最大值(2.383 GPa),后随溅射功率的增大有所减小。
Abstract
Mo films were fabricated at different sputtering powers by DC magnetron sputtering. The deposition rate, surface topography and crystal structure of Mo films were studied. The effects of sputtering power on grain size and stress of Mo films were discussed. AFM analyses show that when sputtering power increases from 20 W to 100 W, the roughness of Mo films raises. The Xray diffraction analysis indicates that all the films are in cubic polycrystal structure. The grain size varies from 14.1 nm to 17.9 nm, and the stress in the Mo films increases firstly and then decreases as the sputtering power increases, reaching a maximum of 2.383 GPa at the sputtering power of 40 W.

廖国, 何智兵, 陈太红, 许华, 李俊, 谌加军, 唐永建. 溅射功率对Mo薄膜微结构和性能的影响[J]. 强激光与粒子束, 2011, 23(9): 2386. Liao Guo, He Zhibing, Chen Taihong, Xu Hua, Li Jun, Chen Jiajun, Tang Yongjian. Effects of sputtering power on structure and property of Mo films deposited by DC magnetron sputtering[J]. High Power Laser and Particle Beams, 2011, 23(9): 2386.

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