根据激光敌我识别系统的使用要求，选择H4和SiO2作为高低折射率材料，借助Macleod和TFCalc软件进行膜系优化设计和分析。采用电子束真空镀膜的方法并加以离子辅助沉积技术，通过正交矩阵实验对材料的工艺参数进行调整和优化，利用基片的正反面分别对带通滤光片的长波反射带和短波反射带进行展宽，解决了单面膜层过厚难以控制的问题，制备了符合要求的激光滤光膜。镀膜后的基片在532，632，905，1064和1550 nm波长处的透射率小于0.2%，808 nm波长附近的平均透射率大于95%。并在532 nm和1064 nm波长处具有较高的激光损伤阈值，能承受恶劣的环境测试，满足激光敌我识别系统中光学仪器的使用要求。

According to the requirement of laser identification between friend or foe system, chosing H4 as the material of high refractive index and SiO2 as the material of low refractive index, the film system is designed and optimized with the help of Macleod and TFCalc software. Adopting electron beam vaccum deposition method with the aid of ion assistant deposition technology as well as using orthogonal matrix tests to adjust and optimize technological parameters of the materials, using two sides of the substrate to broaden the long and short wavelenth reflection bands respectively, the monitoring problem of thicker stack on one side has been solved and filter film to meet the demand has been deposited. The reflectances at 532, 632, 905, 1064 and 1550 nm wavelengths are less than 0.2%, and it makes the transmittance over 95% at 808 nm wavelength. The laser induced damage thresholds (LIDTs) of the filter at 532 nm and 1064 nm are higher. Moreover, the filter can endure the test of bad environment, meeting the using requrement of the identification between friend or foe system.