采用蒙特卡罗(Monte Carlo)方法，研究了脉冲激光烧蚀沉积纳米硅(Si)晶薄膜过程中，靶衬间距对传输中溅射粒子密度和速度分布的影响。研究结果表明，在相同时刻，烧蚀粒子和环境气体的交叠区离开靶面的距离随靶衬间距的增加而增大，并且到达离开表面最大距离的时间随靶衬间距的增大而明显增长。速度分布曲线的峰位和峰值强度均出现了周期性变化的趋势，并且均随着靶衬间距的增大而增长。

The influence of the target-to-substrate distance on the spatial density distribution of the particles (Si and He) and the velocity distribution of the Si particles is investigated via Monte Carlo simulation. The results indicate that the distance of the mixed regions from the target increases with the target-to-substrate distance increasing at the same time, and the time of reaching the maximum distance from the target increases with the target-to-substrate distance increasing. The peak positions and intensities of the curves of velocity distributions periodically oscillate and increase with the target-to-substrate distance increasing.