半导体光电, 2011, 32 (3): 389, 网络出版: 2012-01-04
磁控溅射台电控系统的改造
Reformation of the Electricalcontrolling System of Magnetron Sputter
摘要
针对当前磁控溅射台存在真空自动准备和手动自动切换不完善等缺点,以DV602磁控溅射台为例,对其电控系统进行了改造。设计了以PLC为控制系统核心、以触摸屏为人机接口的电控系统,控制系统的可靠性和稳定性得到提高,且界面友好,操作方便。
Abstract
These are some problems for existing magnetron sputters in the aspects of vacuum automatic preparation, switching at handcontrol and autocontrol, etc. In this paper, DV-602 magnetron sputtering device is taken as the example to make modifications of the electricalcontrolling system. The system takes PLC as the core controller and the touch screen as the manmachine interface, which makes the system own the features of friendly surface, simplicity and easy operation. After these modifications, the reliability and stability of the controlling system are greatly improved.
赖忠良, 李莉, 张勇, 贾易洪, 唐代飞. 磁控溅射台电控系统的改造[J]. 半导体光电, 2011, 32(3): 389. LAI Zhongliang, LI Li, ZHANG Yong, JIA Yihong, TANG Daifei. Reformation of the Electricalcontrolling System of Magnetron Sputter[J]. Semiconductor Optoelectronics, 2011, 32(3): 389.