针对自由曲面无固定解析式的特点，根据感光材料的光化学作用原理，以及曝光能量与曝光深度的制约关系，提出采用变剂量曝光的光刻方法制作自由曲面光学微器件。从光传播理论出发，分析了曝光过程光刻胶中光能量分布规律和曝光深度随曝光能量的变化关系，建立了光分布规律的数学模型，并应用计算机软件对模型进行仿真。结果表明：光能量在胶膜内呈规律性分布，在能量一定的情况下曝光深度随时间规律性增加，并逐渐达到饱和。同时，应用长春理工大学BOL500型复合坐标激光直写系统，选用美国Futurrex62A光刻胶、波长412 nm He-Ge气体激光器、5‰NaOH显影液进行曝光及显影实验，所得实验数据与仿真结果吻合。

According to the feature of the free-form without constant analytic expression, the varying-dose exposure lithography method for free-form micro-optical element is presented, according to photochemica theory of photosensitive material and the relation between exposure energy and exposure time.In this paper ,the distribution law of light amplitude and relationship between exposure energy and exposure time is analyzed on basis theory of optical propagation.The mathematical model of light distribution law is built and simulated by using computer program.The results indicate that light energy distribute in accordance with specific law, and the exposure depth increase with exposure time.Meanwhile, we finished the experiment of exposure developed by laser direct system , Futurrex62A photoresist, 412nn He-Ge laser device, 5‰NaOH developer solution.The experimental data coincide with simulation result well in comparative analysis.