提出了一种基于空间光调制器的并行光刻制备微透镜阵列的技术。采用数字微反射镜器件输入光刻图形，结合热回流技术，制作任意结构和排布的微透镜阵列。无限远校正显微微缩光学系统的长焦深保证了深纹光刻的实现，热回流法提供了良好的表面光滑度。与传统逐层并行光刻和掩模曝光技术相比，提出的技术方案更加便捷灵活，特别适合制作特征尺寸在数微米至百微米的微透镜阵列器件。得到的微透镜阵列模版经过电铸转移为金属模具，利用紫外卷对卷纳米压印技术在柔性基底上制备微透镜阵列器件，在超薄液晶显示、有机发光二极管(OLED)照明等领域有广泛应用。

An approach of fabrication of microlens arrays using spatial light modulator based lithography method is proposed. Combined with themal reflow method, digital micro-mirror device is used to pattern microstructure, and microlens arrays with arbitrary structure and topology can be obtained. The patterns on thick photoresist layer are projected by an infinity-corrected optical system. Good surface quality can be realized by thermal reflow method. Compared with classical stereolithography and mask-based exposure lithography method, the proposed method has the advantage of low-cost and high efficiency, especially suitable for fabricating microlens arrays which feature size ranging from several micrometers to hundreds of micrometers. The obtained microlens array can be transferred to a nickel mold by quasi-lithography electrodeposition and modeling (LIGA) process, which can be used as an imprinting mold. The flexible microlens array film can find wide application in novel ultra-thin liquid crystal displays, organic light-emitting diodes (OLED), etc.