为研究沉积压强对非晶硅薄膜光学性能和结构的影响，通过改变沉积压强并采用射 频磁控溅射制备a-S:H薄膜。借助椭偏仪、紫外可见分光光度计和拉曼光谱来分析薄膜的光学性 能和微结构。研究发现，在较低沉积压强下薄膜的致密度得到提高，光学带隙偏小，折射率和消光系 数较大，短程序和中程序得到改善，体内缺陷较少。并且椭偏拟合参数Α越大，意味着薄膜的质量越 好。结果表明，沉积气压确实对薄膜的微结构和光学性能具有重要影响。

In order to find out the pressure effect on the structure and optical property of a-Si:H films，which is fabricated by radio frequency magnetron sputtering with varying deposition pressures，spectroscopic ellipsometry (SE)，ultraviolet and visible spectrophotometer and raman spectrum are adopted. It is found that a lower deposition pressure induces an increased density ，a decreased optical bandgap and an enhancement in refractive index and extinction coefficient ，as weH as the improved short-range order and medium一range order with fewer bulk defects. It is further discovered that the larger the SE fitting parameter Α，the better the quality of films. The result shows that deposition pressure has a great effect on the microstructure and optical properties of the films.