研究了Kirkpatrick-Baez(KB)显微镜成像系统的结构设计、元件制备。通过分析掠入射角、放大倍数和反射镜曲率半径对成像系统调制传递函数(MTF)的影响，确定了KB显微镜系统的初始结构参数，实现了2.5 keV能点多层膜KB显微镜的设计、制备以及装调，在神光Ⅱ强激光装置上完成了像质标定实验。结果表明:2.5 keV能点多层膜KB显微镜在100 μm视场内观测周期为20 μm平面调制靶时的MTF高于0.6，与OMEGA装置同类型KB系统的空间分辨能力相当，明显优于现有的针孔相机和点投影成像技术。该显微镜与条纹相机配合，已成功实现对短扰动波长平面调制靶烧蚀演化行为的动态诊断。

A 2.5 keV multilayer Kirkpatrick-Baez microscope was developed and its imaging characteristics were studied from aspects of optical design and experimental calibration. The optical parameters were determined by analyzing the influences of grazing incidence angle, magnification, and radius of curvature on modulation transfer function(MTF). The multilayer, simultaneously working at 2.5 keV and 8 keV, was designed and coated to complete the system alignment. The imaging result at ShenguangⅡ laser facility shows that the MTF over the object field of 100 μm is above 0.6 for 20 μm wavelength, significantly better than those of the existing pinhole camera and point-projection X-ray radiography. The microscope, coupled with the streak camera, can be used for dynamic diagnostics of target ablation with small spatial perturbation mode.