为了实现曝光工作过程中深紫外投影光刻物镜的动态稳定性，设计了一种能够消除温度和应变影响的光学元件运动学支撑结构，研究了如何利用该支撑结构消除温度变化和外界应变对光学元件面形的影响。首先，计算单个支座的径向柔度，并与有限元分析结果进行比较。然后，分析在不同温度载荷和外界应变工况下光学元件上、下表面面形的变化，并与三点胶粘固定支撑方式下的结果进行了比较。计算结果表明：通过理论公式推导的支座径向柔度与仿真结果的误差绝对值小于22%; 温度升高01 ℃时光学元件上下表面面形RMS值小于036 nm; 平面度公差5 μm时面形RMS值小于005 nm。与三点胶粘固定方式相比，运动学支撑方式能够有效消除温度变化和外界应变对光学元件表面面形的影响。

In order to maintain the dynamic stability of a Deep Ultra-Violet(DUV) lithographic projection objective, a kinematic supporting structure which is able to eliminate the effects of temperature change and external strain is designed. The lens surface deformation due to temperature variation and external strain is studied. Firstly, the theoretical formula for the compliance of a supporting seat is derived, then the radial compliance of the supporting seat is calculated by using the derived formula and is compared with the results of the whole supporting seat from a Finite Element Analysis(FEA) analysis. The lens surface profile variation due to temperature change and external strain is analyzed and the supporting structure is compared with a 3-point glue supporting structure. The calculated results indicate that the absolute difference between the radial compliance obtained from the derived formula and the FEA simulation is within 22%, RMS values of the optical surfaces are less than 036 nm with a 01 ℃ temperature rise, and the RMS values of the optical surfaces are less than 005 nm for a manufacturing tolerance is 5 μm. Compared with the 3-point glue suporting method, the kinematic supporting structure can eliminate the effect of temperature change and outside strain on the lens surface.