熔石英光学元件表面损伤修复点周围的烧蚀碎片是诱导元件损伤的一个主要因素。根据烧蚀程度将修复点周围的烧蚀物质分为两类，然后针对不同类型的烧蚀采取大光斑CO2激光钝化和氢氟酸缓冲溶液刻蚀清洗两种方法对其进行去除处理，并且得到具体的优化处理参数。实验结果表明，两种方法都可以有效地去除修复点周围的烧蚀碎片，达到有效提升修复点抗激光损伤能力的目的。

The ablation debris around the mitigated damage site on the surface of fused silica is one of the major factors inducing the damage of optics. The debris are classified into two types based on the ablation degree. The large-beam CO2 laser passivation and the buffered hydrofluoric acid solution etching method are used to eliminate the debris according to its types. Meanwhile, the corresponding optimal condition parameters are also obtained. The results show that the two methods can effectively eliminate the debris and improve the resistance damage capability of mitigated sites.