综述了深紫外光学薄膜技术在中科院长春光学精密机械与物理研究所的研究进展。为满足高性能深紫外光学系统对薄膜光学元件的需求，在以下方面开展了系统研究：定制了两台深紫外光学薄膜专用沉积设备，分别用于高性能深紫外光学薄膜的热蒸发与离子束溅射沉积工艺，实现了φ410 mm光学元件的镀膜；通过优化薄膜沉积工艺，双面镀膜样品在193 nm处典型透过率为98.5%~99%；对影响光学元件面形精度的因素进行了考察，可实现的膜厚均匀性为0.1%(rms)，能够满足高质量深紫外光学系统的容差要求；采用X射线衍射方法对薄膜应力进行了测量，并采用有限元方法分析了应力对元件面形的影响；针对影响薄膜实用性能的因素，提出了针对性的解决方法，采用紫外辐照方法恢复了环境污染引起的透过率下降，发展了基于晶振监控法的膜厚精确控制方法。基于这些研究的阶段性成果，明确了下一步的研究方向。

Developments of Deep Ultraviolet(DUV) coating technologies in Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences(CIOMP) were reviewed. Some researches were carried out systematically to meet the requirements of high quality DUV optical systems for coating processes. Two special systems were customized for evaporation and ion beam sputter deposition techniques respectively, which could coat the substrates for φ410 mm optical elements. After optimizing deposition technology, the typical transmission for a both-side coating sample at 193 nm is in the range of 98.5%~99%. The factors that effect on the figure accuracy of optical elements were investigated, the obtained thickness uniformity of coatings is 0.1% rms and it meets the required tolerances of high quality DUV optical system. Coating stresses were measured by using X-ray diffraction technique and their effects on the figure error were analyzed by using finite element simulation. In consideration of the practical utilities of coatings, several kind of solving methods were proposed such as the recovery of the transmission degradation caused by environmental pollution with UV radiation and the accurate control of coating thicknesses based on crystal monitor technique. Finally, it points out the research directions in further based on the results mentioned above.