光学与光电技术, 2012, 10 (5): 58, 网络出版: 2012-12-05  

基于MOS电阻阵列的红外目标模拟器非均匀性校正技术研究

Infrared Target Simulator of Non-Uniformity Correction Based on MOS Resistor Arrays
作者单位
上海机电工程研究所, 上海 200233
摘要
红外成像目标模拟器是红外成像半实物仿真系统中的关键组成部分,基于微机械技术发展起来的MOS电阻阵列是红外图像生成器的重要发展方向。其中红外图像生成的质量是设计和研制红外成像目标模拟系统需重点考虑的问题。多种原因导致电阻阵列具有一定的非均匀性,因此在使用之前必须对其进行非均匀性校正。结合实际应用,阐述了基于MOS电阻阵列的红外成像目标模拟器的非均匀性产生机理,建立红外目标模拟器的非均匀性修正数据库对红外目标模拟器的图像数据源进行校正和补偿,产生校正后的图像数据,完成对红外目标模拟器存在非均匀性的离线修正。
Abstract
Infrared imaging target simulator is a key component in the semi-physical simulation system of infrared imaging. The MOS resistor array based on MEMS technology development is an important development direction of the infrared image generator. The quality of infrared images generated is the key consideration for designing and developing a infrared imaging target simulation system. A variety of reasons lead to the non-uniformity of the resistor array, therefore, the non-uniformity correction is necessary before it is used. Combining with the practical application, the generation mechanism of the non-uniformity of infrared target simulator based on MOS resistor array is eleborated. The non-uniformity correction of infrared target simulator database of infrared target simulator image data source for correction and compensation is established. The corrected image data to complete the offline correction of non-uniformity of the infrared target simulator is provided.

耿旭, 冯晓晨, 李凡. 基于MOS电阻阵列的红外目标模拟器非均匀性校正技术研究[J]. 光学与光电技术, 2012, 10(5): 58. GENG Xu, FENG Xiao-chen, LI Fan. Infrared Target Simulator of Non-Uniformity Correction Based on MOS Resistor Arrays[J]. OPTICS & OPTOELECTRONIC TECHNOLOGY, 2012, 10(5): 58.

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