紫外曝光机是印刷线路板(PCB)制作工艺中的重要设备,PCB高密度、微细化的发展趋势,对曝光机光照均匀性,平行性的要求越来越高。为了找出可以更好满足市场需求的曝光机光学系统,运用非成像光学方法,对两种不同光学结构曝光机的光斑均匀性进行了对比分析。通过实验可以看出,在通光孔径较大的光学系统中,复眼透镜阵列和方棒对改善系统光照均匀性以及能量利用率的作用,在实验基础上对如何选择光学系统的匀光器件做了对比性阐述。

Ultraviolet exposure machine is an important equipment in the printed circuit board (PCB) manufactruring process. The high density and miniature of PCB is demanding higher level of illumination uniformity and parallel degree. In order to find a better optical system to meet the requirement of exposure machine market, method of nonimaging optics is adopted here to make the comparision of exposure effects between two types of exposure machine with different structures. The conclusion from the simulation is that in the optical system with larger clear aperture, different effects are resulted in improving the illumination uniformity and energy density of the system by using fly eye lens or square rod. Comparision is made on how to choose the light-uniform component in optical system on the basis of simulation.