光学仪器, 2012, 34 (3): 17, 网络出版: 2012-12-06
基于Monte Carlo法的光电跟踪测量系统精度分析和布站优化方法
A new Monte Carlo based measure error analysis and station position optimization method for photoelectrical tracking system
Monte Carlo法 最坏情况法 误差分析 跟踪测量 Monte Carlo method worst condition method error analysis tracking system
摘要
提出一种基于Monte Carlo法的光电跟踪测量系统的分析方法,使用坐标变换方法对光电经纬仪建立了包含照准差、横轴差、竖轴差、传感器误差和编码器误差准确的Verilog-A模型,使用最坏情况法和Monte Carlo法分析了各种误差源对系统性能的影响。并对双站交汇的布站进行了优化,在考虑经纬仪本身误差源和站点位置误差的情况下,使用Monte Carlo法计算了针对特定弹道轨迹的最优布站选择。该方法对光电跟踪测量系统设计具有一定的指导作用。
Abstract
A new measure error analytic method based on Monte Carlo is provided. The accurate Verilog-A model is established based on coordinate transformation, including collimate error, vertical axes error, horizontal axes error, sensor induced error and encoder induced error. The worst condition analysis and Monte Carlo analysis are used to calculate the effect of various error sources toward system characteristic. The station location design problem of double intercross measure for customizing ballistic trajectory is analyzed using Monte Carlo method, taking consideration of the theodolite induced error and station location error.
张振铎, 张彬. 基于Monte Carlo法的光电跟踪测量系统精度分析和布站优化方法[J]. 光学仪器, 2012, 34(3): 17. ZHANG Zhenduo, ZHANG Bin. A new Monte Carlo based measure error analysis and station position optimization method for photoelectrical tracking system[J]. Optical Instruments, 2012, 34(3): 17.