为了给反射镜和光栅组成的光学系统提供一种有效的优化方法,应用吕等提出的两维扩展光源平面对称光学系统的像差理论,Namioka等定义的XUV(极紫外)光栅仪器的评价函数和改进的遗传算法发展了优化设计程序,对一XUV单色仪光学系统进行优化。通过光线追迹程序Shadow进行数值成像计算来验证优化结果,并和相关参考文献中的结果进行比较。比较结果表明应用的评价函数适用于两维扩展光源的XUV单色仪光学系统优化设计。

In order to provide an efficient optimization method for optical system composed of reflector and grating, an optimization program is developed with the aberration theory of plane-symmetric optical systems of two-dimension extended source, proposed by Lv et al, the merit function of XUV (extreme ultra-violet) grating instrument defined by Namioka et al and the improved genetic algorithm, which is used to optimize an XUV monochromator. The numerical calculations of imaging are made with ray-tracing program shadow. The imaging results with the optical parameters from both the optimization and the related reference are compared. The result shows that the merit function is appropriate for the optimization design of XUV monochromator with two-dimension extended source.