针对基于剪切干涉原理的光刻投影物镜波像差检测设备中相移测量的需求，设计了一种移相装置.该装置采用了桥式放大机构，获得了较大放大比和相对紧凑的结构.从原理上对桥式放大机构进行了分析和讨论，得到了输入位移与其放大比之间的函数关系，并得到了其关系曲线.经过非线性有限元分析，对该装置的变形、受力和模态特性进行了验证.验证结果满足检测平台移相要求.

To meet the requirement of phase-shifting measurement of the wavefront aberration detecting stage for lithographic projection objective, based on theory of Shearing Interferometry, a phase-shifting device is designed. Bridge amplification mechanism is adopted to obtain a larger amplification ratio and a relatively compact structure. The theory of the bridge amplification mechanism was analyzed and discussed, and the functional relationship and its curve between input displacement and amplification ratio were obtained. To make sure the availability of this structure, nonlinear finite element analysis was proceeded. And the results meet the requirements of phase-shifting device of wavefront aberration detecting stage.