应用激光, 2012, 32 (6): 464, 网络出版: 2013-01-14   

纳秒脉冲激光熔覆温度场计算及薄膜飞溅机制分析

Calculatation for Nano-Second Pulsed Laser Cladding Temprature Field and Analysis of Thin Film Removal Mechanism
作者单位
1 表面物理与化学重点实验室, 四川 绵阳 621707
2 中国工程物理研究院, 四川 绵阳 621900
摘要
实验上采用磁控溅射在铀、不锈钢、铝基底上分别沉积钼、铌、铝等薄膜后采用纳秒激光熔覆,薄膜发生飞溅,未能形成熔覆层。针对这一问题,采用有限元方法分析了脉冲激光作用的温度场,并对瞬时热膨胀造成薄膜垂直于表面的运动进行了分析。计算以及分析结果表明:由于界面热阻,纳秒激光熔覆薄膜与基底存在较大的温度差,在本例计算铝薄膜与基底温差超过450 ℃。瞬时热膨胀导致薄膜具有向外的速度以及动能。当薄膜动能大于拉伸断裂所需要克服的弹性以及塑性变形能量,薄膜将发生飞溅。理论分析还表明存在一个临界的光束尺寸,当光束小于该尺寸,薄膜不会发生飞溅,熔覆能够发生,对于准分子激光,光束尺寸达微米量级薄膜不会飞溅。
Abstract
Thin films of molybdenum, niobium, aluminium were prepared by magetron sputtering, nano-second laser was employed to clad these thin films on diferent substrates, but the cladding layers wrer not formed, thin films were removed by laser. In order to explain this question, temperature fields were calculated using fem method, kinematic of thin film caused by instantaneous thermo expansion was analysed based on Newton dynamic. Results show there is temprature gap between thin film and substrate due to surface thermo ressistance, in this example, the temperature differences are more than 450 ℃. Instantaneous thermo expansion leads thin film abtained velocity and kinetic energy. If the kinetic energy is greater than elatic and plastic energy of thin film fracture limite, thin film would be removed. Theoretic analysis also shows there is a critical beam size, less than the critical beam size, the thin film would not be removed, for eximer pulsed laser the criical beam size is about micrometer.

张永彬, 宾韧, 郎定木. 纳秒脉冲激光熔覆温度场计算及薄膜飞溅机制分析[J]. 应用激光, 2012, 32(6): 464. Zhang Yongbin, Bin Ren, Lang Dingmu. Calculatation for Nano-Second Pulsed Laser Cladding Temprature Field and Analysis of Thin Film Removal Mechanism[J]. APPLIED LASER, 2012, 32(6): 464.

本文已被 3 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!