光学学报, 2013, 33 (3): 0331001, 网络出版: 2013-01-14  

表面粗糙氢化非晶硅薄膜光学常量的确定

Determination of Optical Constants of Rough Hydrogenated Amorphous Silicon Thin Films
作者单位
河北大学物理科学与技术学院河北省光电信息材料重点实验室, 河北 保定 071002
摘要
由于光学薄膜的透射光谱和反射光谱受表面粗糙程度的影响很大,因此在确定表面粗糙薄膜的厚度及光学常量时,如果不考虑这种影响必然会引起较大的误差。利用标量波散射理论,引入表面均方根粗糙系数,对粗糙薄膜表面的光散射进行了细致分析,得出了光散射影响下薄膜系统透射系数的表达式。在此基础上计算的薄膜厚度以及透射光谱与制备的氢化非晶硅薄膜的相应测量结果基本一致,由此确定的光学常量也更接近实际量值。该方法的运算过程不基于最小值优化算法,无需复杂软件辅助,是准确确定表面粗糙薄膜的厚度以及光学常量的一种有效方法。
Abstract
The transmission and reflection spectra of the rough thin films are directly affected by the surface roughness. If this effect is not taken into account, there will be evident error for the calculation of thickness and optical constants of rough thin films. Using the scalar wave scattering theory, the light scattering caused by rough film surface is analyzed in detail by introducing the surface root mean square roughness, and the transmittance expression of the thin film system is obtained. On this basis, the calculated film thickness and transmission spectrum are in agreement with the measurement results of the prepared hydrogenated amorphous silicon (a-SiH) thin film. The determined optical constants are closer to the actual ones. Because the calculation process is not based on the minimum value optimization algorithm and does not need the aid of complicated software, it is an effective and exact method to determine the thickness and optical constants of rough thin films.

丁文革, 卢云霞, 马登浩, 苑静, 侯玉斌, 于威, 傅广生. 表面粗糙氢化非晶硅薄膜光学常量的确定[J]. 光学学报, 2013, 33(3): 0331001. Ding Wenge, Lu Yunxia, Ma Denghao, Yuan Jing, Hou Yubin, Yu Wei, Fu Guangsheng. Determination of Optical Constants of Rough Hydrogenated Amorphous Silicon Thin Films[J]. Acta Optica Sinica, 2013, 33(3): 0331001.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!