由于光通信网络的“最后一公里”问题有望通过650 nm的聚合物光纤系统得到解决，制备了与之匹配的16×16信道聚合物阵列波导光栅波分复用器。器件设计采用了矩形波导结构，针对650 nm波长的光，选用的芯层与包层折射率分别为1.4888和1.482，通过软件进行光传播模拟，信道插入损耗为2.3~5.1 dB，串扰水平为-24 dB，模拟信道的间隔为1.6 nm。器件的制备选用了实验室自主合成的折射率不同的聚甲基丙烯酸甲酯材料作为芯层与包层，利用光刻和感应耦合等离子体刻蚀工艺得到了较为完好的器件形貌，最终制备出的样品面积为4 cm×3 cm。通过聚合物光纤（POF）将650 nm波长的光耦合进入器件进行测试并获得了良好的波分复用效果。红光波段的阵列波导光栅波分复用器在未来的光通信及传感领域中将起到重要作用。

Because “the last kilometer” problem of the optical communication network is expected to be solved by the 650 nm polymer optical fiber system, a 16×16 channel polymer array waveguide grating (AWG) wavelength division multiplexer is successfully fabricated to match the system. The design of the device is chosen as rectangular waveguide structure, while the refractive indices of the core layer and cladding layer are selected as 1.4888 and 1.482, respectively. By OptiBPM software, it is obtained that the channel insert loss is from 2.3 dB to 5.1 dB, the crosstalk level is -24 dB, and the channel spacing is 1.6 nm. For the fabrication of device, the polymethyl methacrylate (PMMA) material is choosed which is synthesized in our laboratory. By the ultraviolet (UV) lithography and inductively coupled plasma (ICP) etching process, a fine waveguide morphology is obtained, and finally the sample′s area is 4 cm×3 cm. The polymer optical fiber (POF) is used to couple the 650 nm visible light into AWG device for testing and excellent multiplexing/de-multiplexing performances are achieved. The AWG wavelength division multiplexer in red-light wave band will play an important role in the future optical communication.