中国激光, 2004, 31 (s1): 516, 网络出版: 2013-01-29
对激光烧蚀沉积Ag薄膜生长率和环境气压关系的理论解析
On Growth Rate of the Ag Thin Film Versus Ambient Pressure in Pulse Laser Ablation
摘要
为了对激光烧蚀沉积Ag薄膜生长率和环境气压关系进行定量解释,考虑烧蚀产物在惰性气体环境中的动力学过程以及薄膜生长的沉积和二次溅射过程,并假定二次溅射几率正比于入射粒子的动能,建立了激光烧蚀沉积纳米薄膜生长的动力学模型.定量地解释了T.Scharf等人在惰性气体He,Ne,Ar,Xe环境下烧蚀沉积Ag膜的实验结果,所出现偏差乃计及大颗粒所致.
Abstract
In order to explain quantitatively the relation between the growth rate of Ag thin film and ambient gas pressure in the pulsed laser ablation, considering the dynamic process of the ablated particles in inert ambient and the deposition and resputtermg of thin films, supposing the probability of resputtering is proportional to kinetic energy of the ablated particles, the dynamic model of growing film is establish. The experiment result of T.Scharf et al. is explained quantitatively by considering the big grains.
王英龙, 周阳, 傅广生, 彭英才, 褚立志, 张荣梅. 对激光烧蚀沉积Ag薄膜生长率和环境气压关系的理论解析[J]. 中国激光, 2004, 31(s1): 516. WANG Ying-long, ZHOU Yang, FU Guang-sheng, PENG Ying-cai, CHU Li-zhi, ZHANG Rong-mei. On Growth Rate of the Ag Thin Film Versus Ambient Pressure in Pulse Laser Ablation[J]. Chinese Journal of Lasers, 2004, 31(s1): 516.
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