中国激光, 2002, 29 (s1): 462, 网络出版: 2013-02-23
1315 nm高反射率硅镜的膜系分析
Analyses of Si-mirror Film Systems with High Reflectance at 1315 nm
摘要
利用TFCALC薄膜设计软件包对TiO2/SiO2, Ta2O5/SiO2和Si/SiO2膜系中心波长为1315 nm的硅镜反射特 性进行了仿真模拟。给出了正入射与45°斜入射情况下三种膜系硅镜的反射特性,并进行了分析与讨论。
Abstract
Reflectance properties of silicon mirrors with TiO2/SiO2, Ta2O5/SiO2, and Si/SiO2 film systems at 1315 nm are numerically analyzed, and discussed under conditions of normal and 45° tilt angle incidence, respectively. The results show that reflectance properties of TiO2/SiO2 and Ta2O5/SiO2 are similar; theoretical reflectivity is less than 99.95% for 1315 nm laser wavelength. Theoretical reflectivity of Si(c)/SiO2 stack can be more than 99.99%.
彭玉峰, 程祖海, 张耀宁, 周次明, 杨春华. 1315 nm高反射率硅镜的膜系分析[J]. 中国激光, 2002, 29(s1): 462. PENG Yu-feng, CHENG Zu-hai, ZHANG Yao-ning, ZHOU Ci-ming, YANG Chun-hua. Analyses of Si-mirror Film Systems with High Reflectance at 1315 nm[J]. Chinese Journal of Lasers, 2002, 29(s1): 462.
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