离子辅助轰击能有效改善非晶碳膜(a-C)的质量。用脉冲激光(532 nm,3.5×108 W/cm2)烧蚀石墨靶, 同时 用Ar+轰击膜面,在Si(100)衬底上沉积a-C膜。用扫描电镜和拉曼光谱对膜结构作了分析。结果表明, 在较低气 压和较高的射频功率下制备的a-C膜质量较好, 同时, 激光重复频率对膜生长也有显著影响。

Ion-assisted bombardment is an effective method to improve a-C film. a-C films were deposited on Si (100) by pulse laser (532 nm, 3. 5×108 W/cm2) ablating graphite target with Ar+ bombarding growing films simultaneously. Scanning electrical microscope and Raman spectra were applied to analysis film structure. As a result, lower working pressure and higher RF power is helpful to prepare a-C film, meanwhile, laser repetition has evident influence on film s growth.