设计了一种采用全球面透镜并具有变焦距功能的光刻系统。系统具有4个机械变焦的位置，两片负透镜作为变倍组，两片正透镜作为移动补偿组，补偿在变焦过程中由于系统共轭距离变化造成的像面移动。该系统光学总长为653.67 mm，系统采用的22片透镜元件，全部采用球面设计，同时系统中没有使用特种光学玻璃。该系统工作在光刻常用波长405 nm下，其500 lp/mm调制函数值在4个变焦位置和所有视场内均大于0.40，绝对畸变小于六分之一特征尺寸。设计结果表明该系统成像效果良好，制作成本低，适用于工作在刻蚀微米量级分辨率、变焦距双远心光刻系统中。

A zoom functional optical lithography system with all spherical surfaces is designed. The system can automatically realize four zoom positions, and is comprised of two negative lens working as zoom group, two positive lens working as compensatory group to compensate the image surface shift induced by the conjugate distance change during the zooming motion. The system has an optical length of 653.67 mm with 22 pieces of lens. All the components are spherical surface and no special glass is employed. Under the 405 nm working wavelength, the modulation transfer function of this up-to-date lens is greater than 0.4 with 500 lp/mm at all four zooming positions and field of view and the absolute distortion is less than one sixth characteristic dimension. The result illuminates that the lens system design meets the requirement of good image quality and low cost for manufacture, and it can be applied in micrometer solution zoom optical lithography system.