激光与光电子学进展, 2013, 50 (3): 030005, 网络出版: 2013-03-01
极紫外光学表面污染控制技术的研究进展 
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Development of Contamination Control Techniques for EUV Optics Surfaces
光学制造 极紫外光刻 光学表面污染 污染控制 氧化 碳沉积 optical fabrication extreme ultraviolet lithography (EUVL) optics contamination contamination control oxidation carbon deposition
摘要
极紫外(EUV)光刻机中光学元件的污染和采用的污染控制策略是影响光刻机性能的重要因素，其中污染主要包括光学表面碳沉积和光学表面氧化，污染控制技术包括智能气体混合技术、保护层技术和污染物清洁技术。着重论述了上述两种主要污染形式和三种污染控制技术的研究进展，对EUV光刻机中污染研究的前景进行了展望，并指出其发展面临的挑战及有待解决的关键技术。
Abstract
The optics contamination and the contamination control strategies used in extreme ultra-violet lithography (EUVL) directly affect the performance of optics system. We summarize the main achievements in the research of optics contamination, such as carbon deposition and oxidation of optical surface, and contamination control strategies which include intellegent gas blending, protective capping layer and contamination cleaning. The challenges and key technologies are also presented.
雷敏, 李小平, 苗怀坤. 极紫外光学表面污染控制技术的研究进展[J]. 激光与光电子学进展, 2013, 50(3): 030005. Lei Min, Li Xiaoping, Miao Huaikun. Development of Contamination Control Techniques for EUV Optics Surfaces[J]. Laser & Optoelectronics Progress, 2013, 50(3): 030005.
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