针对大面积且高密度 PCB光刻, 利用 ZEMAX光学设计软件, 设计了一种 8片式光刻投影物镜。该物镜采用对称双高斯结构, 放大倍率为 -1, 数值孔径 NA=0.06, 单次曝光面积 Φ=80 mm, 具有优于 7 μm的分辨力和 120 μm的焦深。通过对该镜头进行公差分析, 表明最紧公差为部分元件倾斜要小于 0.017°。用 Monte Carlo方法模拟了制造 50组镜头的成像质量, 得到在空间频率 72 line/mm处, 90%的镜头的 MTF>0.58, 因此加工装配时能保证 90%以上的成品率。

For large-area and high-density Printed Circuit Board (PCB) lithography, we use ZEMAX optical design software to design a kind of lithographic projection lens with 8 optics element． Symmetrical double Gaussian structure is applied in the lens, the magnification is -1, and numerical aperture NA = 0.06. It can exposure a area of Φ = 80 mm at a time, and have better than 7 μm resolution and 120 μm focus shift．The result of tolerance analysis show that the tightest tolerance is part of the element tilts, which should be lower than 0.017 °. We use the Monte Carlo method to simulate fabricating and assembling 50 group of lens. The results show 90% of the lens MTF > 0.58 at spatial frequency 72 line/mm, which can ensure more than 90% yield when they are fabricated and assembled.